Abstract
A thermo-optical coefficient (TOC) test platform based on FILMeasure-20 was designed and the thermal coefficient of hydrogenated amorphous silicon (a-Si:H) thin films material at 1330 nm was tested. a-Si:H were deposited on the quartz glass using a plasma-enhanced chemical vapor deposition (PECVD) system. Fourier transform infrared spectrometer (FTIR) was used to characterize the infrared spectral feature of films. The hydrogen content of films was influenced by different radio frequency (RF) power and deposition pressure conditions according to the FTIR spectra and theoretical analysis, and the thermo-optic effect of a-Si:H varied with temperature characteristics. Experimental results indicated that selecting the appropriate process conditions to prepare a-Si:H films can effectively increase or avoid the impact of thermo-optical effect on the optical devices.
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