Abstract
Energy absorption buildup factor (EABF) and exposure buildup factor (EBF) of bismuth borate glass systems in structure (75–x)$$\text {B}_2\text {O}_3$$–$$x\text {Bi}_2\text {O}_3$$–$$10\text {Na}_2\text {O}$$–$$10\text {CaO}$$–$$5\text {Al}_2\text {O}_3$$ ($$0\le {x} \le 25 \text { mol}\%$$) have been investigated for photon energy region between 0.015 and 15 MeV and for penetration depths of 1–40 mfp. Five parameters (G–P) fitting method has been carried out for computations procedure. The calculated values of EABF and EBF have been observed to be dependent on photon energy, penetration depths and on the concentration of $$\text {Bi}_2\text {O}_3$$ mol% in the glass sample. It has been found that BOB25 glass offers better gamma-ray shielding than other samples. In addition, the values of EABF and EBF have been compared and significant differences up to $$8\%$$ have been noted in intermediate energy region.
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