Abstract
The integrated circuit (IC) products fabricated in the scaled-down CMOS processes with higher clock rate and lower power supply voltage (VDD) are more sensitive to the transient/switching noises on the power lines with the parasitic inductance induced by the bonding wire. The typical method to suppress the power line noise is to add on-chip decoupling capacitors. Meanwhile, electrostatic discharge (ESD) is also a challenging issue on IC reliability in advanced CMOS technology. For the ICs fabricated in an advanced process, with the thinner gate oxide, the circuits are particularly vulnerable to the charged-device model (CDM) ESD events. However, there was very limited research to investigate the ESD robustness on the decoupling capacitors, especially during the CDM ESD events. In this work, the CDM ESD robustness among different types of decoupling capacitors in ICs was investigated in a 0.18- ${\mu }\text{m}$ CMOS technology.
Highlights
Owing to the continued scaling down of CMOS technology, the integrated circuit (IC) products had been operated under the condition of higher clock rate and lower power supply voltage
The pad pairs can be bonded with two wires in series between the pin of IC and the lead frame of the package to extend the length of bonding wire for testing with the increased parasitic inductance
After the charged-device model (CDM) electrostatic discharge (ESD) tests are finished, the standby leakage current and electrical function verification are used to judge whether the device under test (DUT) is passed or failed
Summary
Owing to the continued scaling down of CMOS technology, the IC products had been operated under the condition of higher clock rate and lower power supply voltage.
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