Abstract
We investigate the mechanisms leading to the sulfurization of Cu, Zn, and Sn material during the deposition of Cu2ZnSnS4 (CZTS) films by reactive magnetron co-sputtering. We correlated the deposition parameters to the plasma composition determined by ion mass spectrometry. The behavior of Cu, Zn and Sn targets were studied depending on the H2S(g)/Ar(g) flow ratio and exhibit a transition regime to a compound mode in which stoichiometric films are grown. Mass spectrometry data reveal that Cu and Zn are preferentially deposited as a metal whereas Sn is condensed as a sulfide (SnxSy) due to the MS bond energy of the different compounds. Moreover, 45% of S contained in CZTS films is provided by the reaction between the reactive gas and the almost metallic growing film.
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