Abstract
Ultra-thin platinum (Pt) films were deposited on Si (100) substrates at 160°C by magnetron sputtering and subsequently annealed to form silicides. The thickness of the Pt x Si films was found to be approximately 4 nm as determined by transmission electron microscopy (TEM). X-ray photoelectron spectroscopy (XPS) analysis shows that these films consist of PtSi and Pt 2 Si phases, and a multi-layer configuration of SiO x/ PtSi/Pt 2 Si/Si was detected by angle-resolved XPS. However, the Pt 3 Si phase was not detected by X-ray diffraction (XRD).
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