Abstract
WN/a-Si3N4 thin films have been synthesized by utilizing the energetic ion/electron species emanated from hot, dense pinched plasma column in UNU/ICTP plasma focus operated with nitrogen gas. Structural, chemical, morphological and mechanical properties of synthesized films are studied using X-ray diffraction (XRD), X-ray photoelectron spectroscopic (XPS), field emission scanning electron microscopy (FESEM) and nano-indentation respectively. XRD spectra show WN2, WN, WSi2 phases on exposed samples. XPS results confirm W–Si–N chemical bonding in synthesized films. FESEM micrographs show uniform granular structure of synthesized WN/a-Si3N4 thin films. Surface morphology of synthesized thin films shows that increase in focus shots strongly affects the grain size due to change in ion energy flux. Nano-indentation results show significant increase in hardness with increase in focus shots with maximum hardness of 23.5 ± 1 GPa is observed for 45 focus shots.
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