Abstract
Embedded Mask Patterning (EMP) has been proposed as a cost-effective fabrication method to be capable of patterning sub-5-nm grain sizes for highly ordered L10-FePt media for Heat-Assisted Magnetic Recording (HAMR). Understanding the etching mechanism of FePt is critical to maintaining the highly ordered L10 structure and low damage to magnetic grains. In this research, a reactive Molecular Dynamics (MD) model is developed to study methanol (MeOH) plasma etching on highly ordered continuous L10-FePt media film. The model describes the reactive interaction mechanism between the plasma products CO/H2 molecules and Fe/Pt atoms. It shows the dominant Fe-C interaction upon the dissociation of CO ligands leads to formation of large and volatile Fen-C clusters contributing to high chemical etch yield.
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