Abstract
Growth of Ga2O3 by metalorganic chemical vapour deposition in horizontal flow reactor from trimethylgallium (TMG) and oxygen is studied in a wide temperature range. The growth rate is directly proportional to TMG flow, weakly affected by O2 flow and non-monotonically depends on temperature. Growth rate over 3 μm/h is demonstrated, indicating that TMG can be used for growth of β-Ga2O3 thick layers for device applications.
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