Abstract
We set up a pulsed beam steering system with a simple feedback control method. The system applies an integration circuit to process a 2 μs short pulsed beam with a repetition rate of 25 Hz, and employs an iteration method to correct the beam with a reasonable feedback gain factor. The beam steering system achieves a performance of 30 μm position accuracy and 30 μrad pointing accuracy, and it can not only compensate the drift of the laser source but also correct the external disturbance. The design can be directly applied as a lithography tool.
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