Abstract

The hydrogen atom adsorption sites on the Si{100} surface in the (2×1)-H monohydride, (1×1)-H dihydride, and c (4×4)-H phases have been studied by time-of-flight (TOF) scattering and recoiling spectrometry. The experimental procedures and methods employed were similar to those of paper I [Y. Wang, M. Shi, and J. W. Rabalais, Phys. Rev. B 48, 1678 (1993)]. Structural analyses were obtained by measuring TOF spectra of neutrals plus ions for H atoms recoiled from 4-keV Ar + as a function of crystal azimuthal angle and Ne atoms scattered by a 4-keV Ne + beam as a function of beam incident angle to the surface

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