Abstract
Thin polysilazane films have been prepared by glow discharge polymerization of hexamethylcyclotrisilazane in an electrode static system. An increase in pressure in the reaction system observed during polymerization indicated that the monomer underwent fragmentation in the glow discharge. The structures of thin polysilazane films prepared at various current densities have been determined by elementary analysis, infra-red spectroscopy and gas chromatography. It has been found that fragmentation of hexamethylcyclotrisilazane takes place mainly through the cleavage of SiC bonds and that methyl group content in the polymer film structure decreases with increasing current density. The mechanisms of reactions leading to polysilazane film formation have been discussed.
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