Abstract
The effect of a bias potential applied to the substrate on the structure formation, substructural characteristics, and physicomechanical properties of tantalum diboride nanocrystalline films obtained by the method of nonreactive high-frequency magnetron sputtering has been investigated. It has been shown that the sign and magnitude of the bias potential exert a substantial influence on the structure, composition, and physicomechanical properties of arising coatings. Upon the application of a positive bias potential to the substrate, textured films with a columnar structure, whose greatest hardness was ∼45 GPa and the elasticity modulus was only moderate, ∼350 GPa, have been obtained. Upon the application of a negative bias potential to the substrate, the amorphous cluster films with a hardness of ∼11.5 GPa and an elasticity modulus of ∼144 GPa were condensed.
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