Abstract
A series of W1–xAlxN films (0<x<38.6%, mole fraction) were deposited by reactive magnetron sputtering. The composition, microstructure, mechanical properties and oxidation resistance of the films were characterized by EPMA, XRD, XPS, nano-indentation, SEM and HRTEM. The effect of Al content on the microstructure and oxidation resistance of W1–xAlxN films was investigated. The results show that WN film has a face-centered cubic structure. The preferred orientation changes from (111) to (200). The W1–xAlxN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases. The hardness of the W1–xAlxN films first increases and then decreases with the Al content increasing. The maximum hardness is 36 GPa, which is obtained at 32.4% Al (mole fraction). Compared with WN film, the W1-xAlxN composite films show much better oxidation resistance because of the formation of dense Al2O3 oxide layer on the surface.
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