Abstract
Aim: Deposition of undoped and nitrogen doped amorphous diamond like carbon films and investigation of improved electr ical, optical, field emission as well as structural properties of the films due to nitrogen doping. Materials and Methods : Nitrogen doped diamond like carbon (N - DLC) films were deposited on silicon and glass substrates by using direct current plasma enhanc ed chemical vapour deposition (PECVD) process. Precursor gases used were acetylene and nitrogen. The films were characterized by different techniques such as XRD, FTIR, UV - Vis - NIR spectroscopy. Also electrical conductivities and field emission parameters o f the films were measured. Results and Discussion : XRD spectra showed the amorphous nature of the deposited films. Fourier - transform infrared spectroscopy (FTIR) measurements showed different vibrational modes of tetrahedrally bonded carbon present in the DLC films. With the incorporation of nitrogen into the DLC matrix different CN absorption bands appeared in the FTIR spectra. From FTIR spectra variation of sp 3 /sp 2 ratios in the films with nitrogen concentration in the plasma were measured. The
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