Abstract
The minimum operation voltage (V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> ) of fully depleted (FD) silicon-on-thin-BOX (SOTB) SRAM cells are measured and statistically analyzed. It is newly found that V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> deviates from a normal distribution and follows a log-normal distribution. Furthermore, it is found that the behaviors of the worst V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> are different from the median V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> or static noise margin (SNM), indicating that cell stability of high density SRAM must be judged by the worst V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> .
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