Static Response of Three-Dimensional and Printed Complementary Organic TFTs-Based Static Random-Access Memory

Abstract

A three-dimensional (3-D) and printed static random-access memory (SRAM) based on complementary organic thin-film transistors is demonstrated. The SRAM exhibited the smallest area of 2.1 mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , the highest normalized static noise margin of 62%, and the maximum gain of 16.8 V/V compared to the reported values of organic SRAM cells. The transistors’ 3-D integration minimizes the cell area. The 3-D SRAM cell design enables us to match the strengths of transistors by modifying the dielectric thickness without changing the channel geometry. This high-performance complementary organic thin-film transistors-based SRAM shows its high application potential in large-scale and low-cost wearable intelligent electronics for data storage and processing.