Abstract
AbstractThe applicability of atomic layer deposited (ALD) metal oxides as protective, encapsulating barriers for bioimplants and wearable technology is tested by determining the corrosion resistance of the films. Al2O3, HfO2, TiO2, and ZrO2 are deposited at 100°C and prove to be cytocompatible through MTT cell proliferation assay measurements. Electrochemical impedance spectroscopy (EIS) measurements are conducted in phosphate buffered saline (PBS) solution, and simulated saliva and sweat solutions for 21 days using a three‐electrode setup. The resulting data demonstrates the mechanism of material degradation through equivalent electrical circuits fits. Of the metal oxides tested, HfO2, TiO2, and ZrO2 are established as viable options for protective coatings by exhibiting enhanced corrosion resistance in three biological environments. ALD TiO2 is most stable in PBS solution, while ALD ZrO2 is most stable in the simulated saliva and sweat solutions.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
