Abstract
Abstract The negative cluster ion mass distribution under cesium impact of graphite and amorphous carbon samples was studied using a cesium sputter negative ion source. In the case of graphite sputtering, the regular odd-even oscillations with the even clusters being higher in intensity than the odd ones for Cn − upto n = 9 and a reversal in this trend for n > 13 as observed by several others1 was confirmed. On the other hand, in the case of amorphous carbon sputtering, the intensity distribution pattern was seen to be similar to that of graphite upto n = 9, but the trend of even clusters having higher intensity continued upto n = 17, beyond which the pattern was similar to that of graphite. In the case of amorphous carbon sputtering, the intensity drop from C2 to C18 can be represented by a power law with a single exponent, whereas in the case of graphite sputtering, two different exponents are required to explain the slower fall from C2 to C8 followed by a steeper drop from C9 to C18. Further, the intensity distribution of the CsCn − clusters was also found to be different in the two cases.
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