Spectroscopic ellipsometry measurements of thin metal films

Abstract

Optical methods are used to determine the thickness of thin metal films, with emphasis on spectroscopic ellipsometry and transmission. We discuss the conditions where this is possible and how to determine the optical constants for the material. The determination of the thickness of each of two metals in a bimetallic stack is discussed. Finally, by measuring thickness with these methods and measuring weight gain, we determine the density of platinum deposited by evaporation and deposited by a simple sputter deposition method. Explicitly, one of the results is that the determined optical constants depend on the deposition method. This implies that, with only a few exceptions, one must determine the optical constants of the material of interest, and that it is inappropriate to use values from another source such as a handbook or from another investigator. The resulting optical constants in this work suggest that the microstructure of the platinum films from the two different methods will not be the same, and x-ray diffraction and sheet resistance measurements verify that this is the case. Specifically, the significantly lower extinction coefficient of the sputter-deposited films correlates with a higher sheet resistance.