Abstract
The total energy influx for a typical radiofrequency process plasma has been measured by means of a simple thermal probe. The procedure is based on the measurement of temporal slope of the substrate temperature during the plasma process. A substrate dummy which is thermally isolated and inserted into the plasma at substrate position served as thermal probe. It can be moved in vertical and horizontal directions in order to measure the different energy influxes and their topology in the reactor vessel. The knowledge of the spatial distribution is important for coating or sputtering processes.Different contributions to the total energy influx can be identified by different orientation of the thermal probe. If the thermal probe is orientated to the rf-electrode (“down”) the energy influx is much higher than in the opposite direction. This difference can be explained by an additional influx due to the secondary electron emission from the powered rf-electrode.
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