Abstract
SnCl4 and EDTA-4Na were dissolved in a 2 mol/dm3 CH3COOH - 2 mol/dm3 CH3COONa buffer solution, and was adjusted to pH4.1 by adding 2 mol/dm3 CH3COOH or 2 mol/dm3 CH3COONa solutions. 100 cm3 of the electrolyte was used. In the stationary state, Sn film was not deposited below 100 mA/cm2, and Sn film deposited in the range of 200 to 1000 mA/cm2. However, thickness was not obtained 1 μm. In the sonication, electrodeposited film obtained 5 ∼ 20 μm in the range of 200 to 1000 mA/cm2. Electrodeposition was carried out smoothly, because the mass transfer accelerated with ultrasonic agitation and Sn ion was supplied to electrode surface. Best conditions of sono-electroplating were 0.10 mol/dm3 SnY, pH 4.0, 298 K and 300 mA/cm2. The mass transfer and crystallization processes were most affected with micro-jet and shock wave pressure in the range of 200 ∼ 400 mA/cm2. Exchange current density and reaction rate constant in the sonication increased compared with that in the stationary and vibration states. As for this, an electron reaction becomes fast by the micro-jet or shock wave pressure. Reduction became difficult to break out as sonication was with powerful agitation. The deposited film was smooth and dense surface in the sonication compared with that in the stationary states by the shock wave pressure. [DOI: 10.1380/ejssnt.2006.574]
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
