Abstract
We fabricated a solid-state capacitor on an organic flexible substrate, which has an ultra-thin ferromagnetic Co electrode with a HfO2 dielectric layer formed by atomic layer deposition. Tensile stress was applied parallel to the capacitor plane. The breakdown strain monotonically increases with a reduction in HfO2 layer thickness. From the sheet resistance measurement, strain endurance up to 1.5% is realized in the capacitor with 10 nm thick HfO2. A magnetic anisotropy of the Co layer is controllable by applying voltage between the Co and counter electrode. The modulation efficiency of the voltage-controlled magnetic anisotropy is almost independent of the strain.
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