Abstract
A series of (Ni80Fe20)1−x(Ni0.5Zn0.5Fe2O4)x films were fabricated on Si substrates by means of radio frequency magnetron sputtering and the electrical and magnetic properties were studied. Optimal films with the desired properties of low coercivity Hc ∼ 4 Oe, high saturation magnetization 4πMs ∼ 14.5 kG, and high electrical resistivity ρ ∼ 1500 μΩ cm were obtained. The permeability spectra measured shows that its natural ferromagnetic resonant frequency was about 3.4 GHz. The tested results shown that the sputtering power had an important effect on the films properties and that it can be convenient to adjust the natural ferromagnetic resonant frequency of the films.
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