Abstract
Laminated (Fe97Al3)1-xNx/Ni81Fe19 films have been prepared by reactive RF-diode (RFD) and DC-magnetron (DCM) sputtering within a sputter machine developed for the production of magnetoresistive films. The thickness of the films was typically at ≈0.5 μm with a lamination period between 100 A and 1200 A and a thickness ratio tFeAlN/tNiFefrom 1 to 23. RFD sputtered films exhibit a high Bs (up to 20 kG) and excellent soft magnetic behaviour (Hc= 0.4 Oe, Hk =3 Oe, λs 8 at%, without exhibiting significant differences between center and edge of the substrates. For films with DCM sputtered FeAlN sublayer, however, it was difficult to align the uniaxial magnetic anisotropy by the applied collinear magnetic field, particularly on larger substrates and at low nitrogen concentrations.
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