Abstract
The structure and properties of Co 95Fe 5MeN films (M ≡ Al, B or Si), prepared by r.f. reactive magnetron sputtering with N 2Ar gases, have been studied. Transmission electron microscopy observation reveals that the nitrided films are composed of a very fine network of heterogeneous phases. The electrical resistivity of films increases with increasing nitrogen flow ratio in the sputtering gas (ArN 2) and is attributed to the refinement of structure due to nitridation. The films containing Si or Al exhibit soft magnetic properties, characterized by a good frequency response of permeability. The existence of a larger amount of M further increases the resistivity, suggesting that the presence of the MN phase plays an important role in high resistivity.
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