Abstract
ZnO thin films were grown on c-plane sapphire substrate using plasma-assisted molecular beam epitaxy. The thickness of MgO buffer layers was optimized for structural and electrical properties of the epi-ZnO films. It is found that with MgO buffer growth time of 60 s, the epi-ZnO film exhibited narrow X-ray diffraction peak as well as low surface roughness. In the meantime, the electron concentration reached a minimum of 2.03×10 16/cm 3 and high mobility of 169.4 cm 2/V S. These results demonstrate a route to grow good crystals together with excellent mobility and low residual electron concentration, which can ultimately satisfy the requirement for acceptor doping as well as device engineering.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
