Abstract

We developed a set of processes for depositing silver nanoparticles on a glass substrate that involves using a modifi ed silver mirror reaction, whereby dispersants are added to a conventional silver mirror solution. The whole set of processes was completed in 15 min in a nonvacuum environment, except the cleaning processes with oxygen plasma at 20 Pa, and at a low cost. The processes can be applied to the siteselective deposition of silver nanoparticles by modifying the surface characteristics of glass substrates using a self-assembled monolayer (SAM). We used a microcontact printing method that incorporated a non-photolithographic top-down process to pattern a SAM. The proposed processes are readily applicable to promising applications of metal nanoparticles, such as ultrasensitive sensors and catalysts.

Highlights

  • Research has been conducted on silver nanoparticles for a number of uses

  • The optimal conditions for producing silver nanoparticles on a glass substrate with respect to the concentration of silver nitrate solution, species of reducing agent, dispersant and temperature were deduced by assessing the uniformity of the silver nanoparticle film and the exerting Surface enhanced Raman scattering (SERS) signals

  • We developed a novel process for depositing silver nanoparticles using a modified silver mirror reaction

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Summary

Introduction

Research has been conducted on silver nanoparticles for a number of uses These include using them for ultrasensitive chemical/biological detection because they exhibit local surface plasmon resonance[1,2,3,4,5,6,7] and as a catalytic material because of their extremely large surface/volume ratio.[8,9,10] A promising application of silver nanoparticles is for enhancing surface Raman scattering spectra. To make the best use of the local surface plasmon resonance of silver nanoparticles, the optimal size of silver nanoparticles is 10–100 nm.[17] This leads to difficulties in forming silver nanostructures by top-down techniques, such as photolithography and e-beam lithography, because their formation is time-consuming and costly. Bottom-up techniques are more suitable for manufacturing silver nanoparticles

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