Abstract
By metal-organic vapor-phase epitaxy, we have fabricated InAs quantum dots (QDs) on InGaAs/GaAs metamorphic buffer layers on a GaAs substrate with area densities that allow addressing single quantum dots. The photoluminescence emission from the quantum dots is shifted to the telecom C-band at 1.55 μm with a high yield due to the reduced stress in the quantum dots. The lowered residual strain at the surface of the metamorphic buffer layer results in a reduced lattice mismatch between the quantum dot material and growth surface. The quantum dots exhibit resolution-limited linewidths (mean value: 59 μeV) and low fine-structure splittings. Furthermore, we demonstrate single-photon emission (g(2)(0)=0.003) at 1.55 μm and decay times on the order of 1.4 ns comparable to InAs QDs directly deposited on GaAs substrates. Our results suggest that these quantum dots can not only compete with their counterparts deposited on InP substrates but also constitute an InAs/GaAs-only approach for the development of non-classical light sources in the telecom C-band.
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