Abstract
This study investigates the preparation of Ge/TiO2 multi-layer films using a differential-pumping co-sputtering system (DPCS). This system has two chambers with different atmospheres, pure Ar for the Ge target and 0.5%O2 in Ar for the TiO2 ceramic target. The optical absorption spectra of the multi-layer films obviously shift to visible and near-infrared regions with increasing Ge layer thickness, while keeping O/Ti composition ratios of 2.3±0.1 in TiO2. X-ray diffraction results indicate that the TiO2 layer forms a single-phase anatase structure in the multi-layer films. X-ray photoelectron spectroscopy also indicates that metallic Ge is dominant in the multi-layer film with negligible Ge-oxide. Therefore, DPCS provides a multi-layer film with a single-phase anatase structure in the TiO2 layer and a dominant metallic element in the Ge layer.
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