Abstract
A method for simultaneous measurement of geometric thickness and refractive index of an optical wafer is presented. By using a fiber optic Mach–Zehnder interferometer (MZI) with a free space, the transmission spectrum of a MZI for the optical wafer at different incidence angle is interrogated, and the geometric thickness and the refractive index of the optical wafer are measured simultaneously. With the transmission spectrum, we can obtain a clear interferogram with a high visibility no matter how small the measurement range of the refractive index. Therefore the proposed technique possesses a broad measurement range and low cost. The experimental results show that the maximum errors of the geometric thickness and the refractive index are only 0.007 mm and 0.008, respectively, and that a broad measurement from 1.316 to 3.503 can be achieved.
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