Abstract
The effect of the nonlinearity of the absorptivity and absorption coefficient on the process of the intense photoexcitation of silicon is studied on the basis of a model of the two-photon excitation of a semiconductor with consideration for external emission. Correlation between the results of simulation of the absorption of a femtosecond laser pulse in single-crystal silicon and experimental data under conditions of the femtosecond excitation of surface plasmon polaritons makes it possible to refine the mechanism of changes in the absorptivity and to make an inference regarding the necessity of considering these changes when assessing the conditions of the laser treatment of semiconductors. Avenues for further improvement of the theoretical model are discussed.
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