Abstract
This paper describes experimental results for polishing Si single crystals by means of “mechanochemical polishing method with soft powders”. In this method the powders used are softer than the work materials and react chemically with them. It is shownthat high precision polishing of Si single crystals is materialized by utilizing the solid state reaction between the powder and the oxide layer formed on the Si surface. The followingare the main results obtained.(1) A mirror surface free from mechanical damages is easily produced by polishing with soft powders such as BaCO3 and Fe3O4. High polishing rates are obtainable especially in dry processing.(2) Polishing by a relatively rigid polisher e. g. bakelite brings a polished surface of high flatness.(3) The oxidized and worked layer remaining on the surface polished by BaCO3 powder is much thinner than by conventional mechanical polishing.
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