Abstract
We propose a novel absolute calibrate method for digital holographic microscopy with the sequential shift method using Chebyshev polynomials. We separate the object phase and the aberrations by sequential shifting the sample twice in vertical plane of the optical axis. The aberrations phase is then calculated using the high order Chebyshev polynomials. The correct phase is obtained by subtracting the aberrations from the original phase containing the aberration. This method can compensate for the complex aberrations including high-order aberrations without changing the traditional optical system. Meanwhile, it can effectively protect the medium and high frequency information of the specimen in the phase image. Numerical simulation and experimental results demonstrate the availability and advantages of the absolute calibrate method.
Highlights
Digital holographic microscopy is a nondestructive, label-free, and interferometric quantitative phase-contrast technique, which has an enormous impact in many fields such as biology [1], [2], neural science [3], nanoparticle tracking [4], microfluidics [5], and metrology [6]
We propose a novel absolute calibrate method for digital holographic microscopy with the sequential shift method using Chebyshev polynomials
Just like other traditional interferometric system, digital holographic microscopy system suffers from the system phase aberrations, which is mainly introduced by the microscopy objective and other optical elements
Summary
Digital holographic microscopy is a nondestructive, label-free, and interferometric quantitative phase-contrast technique, which has an enormous impact in many fields such as biology [1], [2], neural science [3], nanoparticle tracking [4], microfluidics [5], and metrology [6]. The system phase aberrations are superposed over the specimen phase information, which needs to be compensated. A lot of physical and numerical methods have been proposed to compensate or calibrate the system phase aberrations. Using the telecentric configuration or tunable lens can introduce the phase aberrations into the reference beam, which will partially compensate the lower order phase aberrations [7], [8]. The double exposure method needs removal the specimen from reference beam in second exposure, and can compensate the total aberrations accurately [9]. The system phase aberrations are descripted by spherical function, parabolic function, and Zernike or Chebyshev polynomials [10]–[13]. We have proposed a method based on the Self-extension of holograms [20], but it is only suitable for the case where the sample distribution is sparse and the sample and background are distinguished
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