Abstract
The structure formed during solid-state synthesis in thin bilayer Al/Ni films with the ratio Al: Ni = 60: 40 (at %) has been investigated. The films were obtained by thermal evaporation in vacuum with a residual pressure of 10−5–10−6 Torr. Solid-state synthesis was performed by diffusion reaction. The sequence of phase formation upon vacuum annealing of bilayer Al/Ni films has been established: Al + Ni → Al3Ni + Ni (Tann = 180°C) → Al3Ni2 (Tann = 220°C).
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