Abstract
AbstractDriven by recent advances in rapid multiphoton single‐focus 3D laser nanoprinting, multifocus variants thereof, and projection‐based multiphoton 3D laser nanoprinting, the necessary average total laser powers from femtosecond laser oscillators or even from amplified femtosecond laser systems have exceeded the Watt level. Aiming at ever faster 3D printing, there exist two options: Using yet more powerful lasers or searching for more sensitive photoresists allowing for higher speeds at comparable or lower power levels. Here, altogether more than 70 different photoresists from the literature and a few new candidates are reviewed with regard to effective multiphoton sensitivity. A dimensionless sensitivity figure‐of‐merit allows to directly compare data taken under sometimes vastly different conditions.
Highlights
Driven by recent advances in rapid multiphoton single-focus 3D laser gies,[6,7,8] computed axial lithography as an nanoprinting, multifocus variants thereof, and projection-based multiphoton 3D laser nanoprinting, the necessary average total laser powers from femtosecond laser oscillators or even from amplified femtosecond laser systems have exceeded the Watt level
“implying achieving finer features or smaller voxel sizes con- As femtosecond or picosecond laser power is a precious comnected with better spatial resolution,[2] increasing the manu- modity associated with a considerable fraction of the cost of facturing speed in terms of the number of 3D printed voxels most advanced 3D multiphoton laser printers, we dedicate per second,[3] and making the main part of this contribution to a screening of sensitive accessible more dissimilar materials as well as complex 3D multiphoton-absorption-based photoresists
As this paper is concerned with minimizing the laser power necessary for multiphoton 3D laser printing, it is interesting to briefly recapitulate whether—for a given fixed photoresist—3D printing using a single laser focus or using an integer number of N ≥ 1 foci leads to a lower required total average laser power P
Summary
For most relevant (negative-tone) photoresists, the incident light induces a chemical reaction via a photoinitiator molecule. This explains the distortions in the first row of Figure 1. The polar opposite of the photoresist accumulation model B) is described by a photoresist that completely “forgets” all below-threshold exposures, for example by fast enough diffusion of small oligomers to regions sufficiently far away from the excitation focus. Such a “forgetting photoresist”[2] would completely change the picture because the above tail-accumulation argument becomes obsolete (cf Figure 1). Neither the Abbe diffraction barrier nor the two-photon Sparrow criterion[2] would apply
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