Abstract

By modification of glasses with ultrafast laser radiation and subsequent wet-chemical etching (here named SLE = selective laser-induced etching), precise 3D structures have been produced, especially in quartz glass (fused silica), for more than a decade. By the combination of a three-axis system to move the glass sample and a fast 3D system to move the laser focus, the SLE process is now suitable to produce more complex structures in a shorter time. Here we present investigations which enabled the new possibilities. We started with investigations of the optimum laser parameters to enable high selective laser-induced etching: surprisingly, not the shortest pulse duration is best suited for the SLE process. Secondly we investigated the scaling of the writing velocity: a faster writing speed results in higher selectivity and thus higher precision of the resulting structures, so the SLE process is now even suitable for the mass production of 3D structures. Finally we programmed a printer driver for commercial CAD software enabling the automated production of complex 3D glass parts as new examples for lab-on-a-chip applications such as nested nozzles, connectors and a cell-sorting structure.

Highlights

  • Pure transparent materials such as quartz glass can be processed to generate 3D structures in a subtractive 3D printing process similar to 3D lithography using the glass as positive-tone resist [1]

  • 3D structures with micrometer precision can be produced by this method called selective laser-induced etching (SLE), known as femtosecond laser irradiation, followed by chemical etching (FLICE), femtosecond laser assisted etching (FLAE), in-volume selective laser etching (ISLE), femto-EtchTM (Franklin, OH, USA) or FEMTOprint® (Muzzano, Switzerland), to name a few names

  • The state of the art is that 3D microchannels and complex movable 3D precision parts can be produced in quartz silica glass and that the SLE process is possible in plenty of transparent materials, both in crystals such as sapphire, quartz, YAG and in glasses such as borosilicate glass

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Summary

Introduction

Pure transparent materials such as quartz glass (fused silica glass) can be processed to generate 3D structures in a subtractive 3D printing process similar to 3D lithography using the glass as positive-tone resist [1]. The state of the art is that 3D microchannels and complex movable 3D precision parts can be produced in quartz silica glass and that the SLE process is possible in plenty of transparent materials, both in crystals such as sapphire, quartz, YAG and in glasses such as borosilicate glass (e.g., borofloatTM or willowTM), alumino silicate glasses, soda lime glass or ultra low expansion glass (ULE). First-time-right 3D printing is possible today for complex 3D parts less than 7 mm in height with a precision of about 10 μm and a maximum tunnel length of 10 mm. In this paper the investigations and the developed processing strategies which enable the subtractive 3D printing of quartz glass precision parts are described

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