Abstract
We fabricated a Schottky barrier diode (SBD) on ion-implanted diamond substrates. The SBDs contained lightly doped regions under the Schottky electrodes and heavily doped regions beneath the Ohmic contacts. The current remained below 6.4 × 10−11 A at reverse biases of up to 10 V, but increased sharply at a forward bias of −3.5 V. The Schottky barrier height and ideality factor under forward bias were estimated to be 1.1 eV and 10, respectively. The hole concentrations obtained by measuring the capacitance at various supplied voltages were in good agreement with the values obtained from the Hall effect measurements.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.