Abstract
In this paper highly textured hydrogen and tungsten co-doped ZnO (HWZO) thin films were obtained through post-etching room temperature fabricated HWZO film. The influences of both the sputtering power and the working pressure on the structural and morphological properties e.g. light trapping of HWZO were systematically evaluated. Higher haze value and EQE for μc-Si:H solar cell showed that HWZO film possessed a uniform textured surface and enhanced light scattering compared to the commercial SnO2: F thin films.
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