Abstract
AbstractThe role of static inductance on ion beam emission in plasma focus devices, based on anomalous resistivity, is reported. The effect of gas pressure variation on the process of energy transfer into plasma is investigated and discussed by using Lee's model. The dependence of ion beam production on filling gas pressure along with change in static inductance is studied. The results show that increase of static inductance in a specific range of operating pressure can enhance the efficiency of dense plasma focus device.
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