Abstract
The thickness of the native oxide layer formed on bulk samples of metals Cu, Fe, Ni and Ti exposed to the ambient atmosphere for different exposure times, ranging from minutes up to 2500 hours, has been determined by electron-probe microanalysis (EPMA). Thicknesses were obtained by measuring the intensity of the OKα line emitted from the studied samples at varying electron incident energies, and analysing it with the help of an EPMA thin-film program. Using the thickness values obtained, the intensity loss of the metal L-line, due to the presence of the native oxide layer, has been calculated. This ranges from 5–8% at 2 keV to 1–2% at 10 keV for Cu, Fe and Ni, while for Ti it goes from 10 to 30% at 2 keV to 1–2% at 10 keV, depending on the exposure time. A correction to compensate for the metal L-line intensity loss due to the native oxide layer is discussed.
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