Abstract
Ti–Al–Zr alloy was implanted with Al at cumulative doses between 1 × 10 17 and 1 × 10 18 ions/cm 2. The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.
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