Abstract
Niobium (Nb) thin films were grown on (1 1 1) and (1 0 0) surfaces of Cu single-crystals using a special Nb evaporation source. The quality of the substrate surface and epitaxial parameters of the Nb over-layers were examined by reflection high energy electron diffraction. Two types of Nb deposit structure have been found and are dependent on the substrate temperature during the deposition. At room substrate temperature disordered Nb layers were observed while, at high substrate temperature (720 K), different azimuthal orientations of Nb(1 1 0) Nb epitaxial over-layers formed for both (1 1 1) and (1 0 0) Cu substrate surfaces.
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