Abstract
Resist-free antireflective (AR) nanostructured films are directly fabricated on polycarbonate (PC) film using thermal-nanoimprint lithography (T-NIL) and the moth-eye shape of AR nanostructure is elaborately optimized with different oxygen reactive ion etching conditions. Anodic aluminum oxide (AAO) templates are directly used as master molds of T-NIL for preparation of AR nanostructures on PC film without an additional T-NIL resist. AR nanostructures are well arranged with a period of about 200 nm and diameter of about 150 nm, which corresponds to those of the AAO template mold. The moth-eye AR nanostructures exhibit the average reflectance of 2% in wavelength range from 400 to 800 nm. From the results, highly enhanced AR properties with simple direct imprinting on PC film demonstrate the potential for panel application in the field of flat display, touch screen, and solar cells.
Highlights
An antireflection (AR) property has been a great interest due to the demands for the enhanced performance in electronic devices such as solar cells and displays [1]
The pore shape of anodic aluminum oxide (AAO) templates was clearly observed on the surface of PC films, AR nanostructure is roughly formed at a pressure of 8 bar, as shown in Figure 2(a) and (b)
There exist the problem of separation between AAO template and PC film for high temperature process over 160°C due to the intense adhesion between inner walls of AAO nano-pores and the melted PC film, which results in the structural damage of AR nanostructures
Summary
An antireflection (AR) property has been a great interest due to the demands for the enhanced performance in electronic devices such as solar cells and displays [1]. There are many techniques available for fabricating AR nanostructure, such as electron beam lithography [4], thermal imprinting [5], hybrid nano-patterning lithography [6], dip pen nanolithography [7] and so on. These techniques still require high cost, complex process, and sophisticated equipments. It is difficult to prepare the periodically uniform nano-sized patterns on large area using molds from these materials. An anodic aluminum oxide (AAO) template can be good candidate for mold material due to the advantages of the facile large scale synthesis via electrochemical method and periodical nano-sized patterns with high aspect ratio [8]
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