Abstract
This study introduces an ice fixed-abrasive polishing (IFAP) technology. Using silica solution IFAP pad and Al2O3 IFAP pad, orthogonal tests were performed on polishing high-definition display panel glass, respectively. The results show that the polishing efficiency and effect polished with silica solution IFAP pad are better than those polished with Al2O3 IFAP pad. The optimised silica solution IFAP parameters are: polishing pressure 0.1 MPa, polishing time 40 min, table velocity 80 r/min and the ratio of accelerator and slurry 1:10. Finally, the IFAP mechanism was studied and it is suggested that IFAP is a comprehensive effect of mechanical removal and microchemical reaction, combined with fixed abrasive polishing and free abrasive polishing.
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