Abstract
SiO2-Ta2O5 waveguide film exhibits a refractive index decrease up to 2% and a simultaneous film thickness increase proportional to the index decrease by CO2 laser irradiation. A partial restoration to the pre-irradiated state is observed by annealing in air at temperatures between 700 and 780 °C. The origin of the index decrease may be due to the density change with Ta2O5 crystallization. For application to the optical circuit design, the effective refractive indices of the index-decreased area are estimated, and a TE0-TE1 mode separation experiment by a 20°angle is done successfully, in order to examine the usefulness of the effective index.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
