Reduction of sidewall roughness, insertion loss and crosstalk of polymer arrayed waveguide grating using vapor-redissolution technique

Abstract

An efficient vapor-redissolution technique is used to greatly reduce sidewall scattering loss in the polymer arrayed waveguide grating (AWG) fabricated on a silicon substrate. Smoother sidewalls are achieved and verified by a scanning electron microscopy. Reduction of sidewall scattering loss is further measured for the loss measurement of both straight waveguides and AWG devices. The sidewall loss in straight polymer waveguide is decreased by 2.1 dB/cm, the insertion loss of our AWG device is reduced by about 5.5 dB for the central channel and 6.7 dB for the edge channels, and the crosstalk is reduced by 2.5 dB after the vapor-redissoluton treatment.