Abstract
We investigate the surface roughness and phonon induced spin and momentum relaxation in ultra-scaled SOI MOSFETs. We show that the spin-flip hot spots characterized by strong spin relaxation can be efficiently removed by applying shear strain resulting in an increase of spin lifetime by orders of magnitude. In contrast, the momentum relaxation time in ultrathin films, which is mostly determined by surface roughness scattering can be only increased by a factor of two, in agreement with strain-induced mobility enhancement data.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
