Abstract

AbstractA set of Al‐Si alloys (0.1 to 0.78 at.% Si) are neutron irradiated at 78 °K at a fast dose (E > 1 MeV) of 1.2 × 1018 n/cm2. The recovery of electrical resistivity is then investigated by isochronal and isothermal annealing. The results are compatible with the view that both interstitials and vacancies interact with Si atoms. The former are trapped during irradiation at 78 °K and are released in stage II‐b; the latter are trapped during their annealing in stage III, forming mobile Si‐vacancy couples which, in turn, either migrate to small interstitial clusters where vacancies annihilate, or combine one another, giving rise to complex aggregates which are eliminated in stage IV.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.