Abstract
We present a simple reaction rate analysis of lithographic patterning using the Non-Reciprocal Photo Base Generation (NRPBG) scheme of Bristol (Bristol, et. al., to be published in Proceedings of the SPIE - The International Society for Optical Engineering, 2010, presentation 7639-4). Multistep reaction kinetics simulations demonstrate that the NRPBG scheme produces clear pitch division upon 193 nm double-exposure, over a range of photochemical reaction rate constants.
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