Abstract
AbstractA dielectric barrier discharge‐based micro‐plasma stamp is used to transfer a micro‐scale pattern onto ultra‐thin octadecanethiolate (ODT) self‐assembled monolayers chemically adsorbed on Au (111). The results show that the specified pattern was transferred onto ODT/Au with a distortion rate of less than 1% and no significant changes in the imprint dimensions. The adsorbates formed during plasma treatment or exposure to air affected the transfer of patterns. The wet‐etching rate for the washed and patterned ODT/Au surface increased 1.6‐fold compared to that for the unwashed one. The boundary of the underlaying Au pattern with plasma exposure increased ≈3% due to lateral diffusion of the Au etching solution. magnified image
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